Preface to the First Edition. Preface to the Second Edition. Acknowledgements. 1 Introduction. Characterization. 3 Simulation of Microfabrication Processes. 4 Silicon. 5 Thin-Film Materials and Processes. 6 Epitaxy. 7 Advanced Thin Films. 8 Pattern Generation. 9 Optical Lithography. 10 Advanced Lithography. 11 Etching. 12 Wafer Cleaning and Surface Preparation. 13 Thermal Oxidation. 14 Diffusion. 15 Ion Implantation. 16 CMP: Chemical?Mechanical Polishing. 17 Bonding. 18 Polymer Microprocessing. 19 Glass Microprocessing. 20 Anisotropic Wet Etching. 21 Deep Reactive Ion Etching. 22 Wafer Engineering. 23 Special Processes and Materials. 24 Serial Microprocessing. 25 Process Integration. 26 MOS Transistor Fabrication. 27 Bipolar Transistors. 28 Multilevel Metallization. 29 Surface Micromachining. 30 MEMS Process Integration. 31 Process Equipment. 32 Equipment for Hot Processes. 33 Vacuum and Plasmas. 34 CVD and Epitaxy Equipment. 35 Cleanrooms. 36 Yield and Reliability. 37 Economics of Microfabrication. 38 Moore's Law and Scaling Trends. 39 Microfabrication at Large. Appendix A Properties of Silicon. Appendix B Constants and Conversion Factors. Appendix C Oxide and Nitride Thickness by Color. Index.
Professor Sami Franssila, Helsinki University of Technology,Finland Sami Franssila has taught courses on microfluidics, bioMEMs,microsystems, nanoscience, silicon microtechnology and thin-filmtechnology at Helsinki University of Technology since 1998. He isgroup leader of the Microfabrication group at Micronova, the Centrefor Micro and Nanotechnology which is run jointly by the VTTTechnical Research Centre of Finland and Helsinki University ofTechnology. Professor Franssila researches into micro- and nanofabrication forfluidic, chemical and biological devices, chemical microsystems andthin film technology. He has authored or co-authored over 60 peer reviewed articles, 120international conference papers and written one textbook Introduction to Microfabrication, published by John Wiley& Sons in 2004.