As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.

Table of Contents

Foreword by Yoshio Nishi Preface, Syed Rizvi INTRODUCTION Introduction to Mask Making A.G. Zanzal MASK WRITING Data Preparation P.J.M. van Adrichem and C.K. Kalus Mask Writers: An Overview S. Babin E-Beam Mask Writers N. Saitou Laser Mask Writers C. Rydberg OPTICAL MASKS Optical masks: An Overview N. Yoshioka Conventional Optical Masks S.A. Rizvi Advanced Optical Masks W. Maurer and F. Schellenberg NGL MASKS NGL Masks: An Overview K.R. Kimmel and M. Lercel Masks for Electron Beam Projection Lithography H. Sano, S. Palmer, and M. Yamabe Masks for Extreme Ultraviolet Lithography P-Y. Yan Masks for Ion Projection Lithography S.A. Rizvi, F-M. Kamm, J. Butschke, F. Letzkus, and H. Loeschner Mask for Proximity X-Ray Lithography M. Oda and H. Yoshihara MASK PROCESSING, MATERIALS, AND PELLICLES Mask Substrate S.A. Rizvi Resists for Mask Making B. Rathsack, D. Medeiros, and C.G. Wilson Resist Charging and Heating M. Bai, D. Chu, and F. Pease Mask Processing S.A. Rizvi Mask Materials: Optical Properties V. Liberman Pellicles T. Yen, C.B. Wang, and R. Heuser MASK METROLOGY, INSPECTION, EVALUATION, AND REPAIRS Photomask Feature Metrology J. Potzick Optical Critical Dimension Metrology R.J. Hoobler Photomask Critical Dimension Metrology in the Scanning Electron Microscope M.T. Postek Geometrical Characterization of Mask Using SPM S. Muckenhirn and A. Meyyappan Metrology of Image Placement M.T. Takac Optical Thin Film Metrology for Photomask Applications E. Apak Phase Measurement Tool for PSM H. Kusunose Mask Inspection: Theories and Principle A. Rosenbusch and S. Hemar Tool for Inspecting Masks: Lasertec MD 2500 M. Yonezawa and T. Matsuyama Tool for Mask Image Evaluation A. Zibold Mask Repairs R. Lee MODELING AND SIMULATION Modeling and Simulation A. Erdmann INDEX